National science foundation hosts educational event
on plasma etch and deposition technology
ST. PETERSBURG, FLORIDA (Aug. 12, 2014) — Academics and semiconductor-industry scientists filled a lecture hall at National Tsing Hua University (NTHU) in Hsinchu, Taiwan recently for an advanced plasma-processing workshop led by Plasma-Therm Principal Scientist Dr. David Lishan, Ph.D.
More than 90 people, representing 24 universities and 21 commercial enterprises, gathered at NTHU for the full-day workshop, which was sponsored by Taiwan’s Tze Chiang Foundation of Science and Technology. Attendees gained insight into fundamental and advanced plasma processing technology used in semiconductor device fabrication, materials research, and nanotechnology.
Attendees’ interests spanned many disciplines enabled by plasma technology, including MEMS, solid-state lighting, power, photonics, and other nanotechnology areas. Plasma-Therm has presented the in-depth plasma-processing workshop at nearly two dozen institutions in the United States, Sweden, Israel, South Korea, Taiwan, Singapore, and China.
Speaking about the workshop, Dr. Jennifer Chang of WIN Corporation, expressed appreciation to Plasma-Therm, Scientech (Plasma-Therm representative for Greater China) and Dr. Lishan, and hopes for “any opportunity to attend another lecture.”
“We have learned a lot of new techniques in nano-and micro-scale materials processing from your instructions,” said Dr. Chia-Fan Chu, an NTHU Postdoctoral Fellow, who praised the lecture content. “These lectures are very useful to us, especially in materials processing and semiconductor research,” he continued. “What was said and taught speaks to us vividly as ever from the printed page.”
Dr. Lishan noted the inquisitiveness of the participants, which included Ph.D. scientists, professors, graduate students, engineers and technology experts from throughout the region.
“It was an active audience, with the attendees asking many insightful questions about plasma technology as it applies to solving today’s challenges in semiconductor fabrication,” Dr. Lishan commented on his return to the U.S. “I continue to be impressed by the innovative directions that researchers around the world are taking in plasma processing. I’m glad we are helping foster new developments as we educate researchers. The networking that I see at our workshops confirms the benefits of these events.”
About National Tsing Hua University and Tze Chiang Foundation of Science and Technology
National Tsing Hua University, founded in Beijing in 1911, was re-established in 1956 in Hsinchu, Taiwan. The 260-acre campus is adjacent to the Industrial Technology Research Institute, National Synchrotron Radiation Research Center, National Center for High-Performance Computing, several other universities, and the Hsinchu Science-Based Industrial Park. NTHU encompasses seven colleges and 18 independent graduate institutes, with nearly 650 full-time faculty members and 12,000 students. NTHU promotes cutting-edge research in many areas, including neural structure, biomedical technology, nano materials, and ultra-high speed networks. Offering degree programs in science, technology, engineering, humanities, social sciences, and management, the university consistently ranks as one of the premier universities in East Asia.
Originally established in 1973 through donations from NTHU alumni, the Tze Chiang Foundation of Science and Technology (TCFST) was renamed in January 1997 to mark a new phase in Taiwan’s technological research and development efforts. TCFST specializes in high-tech personnel training and cooperative endeavors in industrial R&D, making it a vital integration platform for the industrial, government, academic and research sectors. Responding to industrial development and globalization trends of recent years, TCFST actively promotes training in forward-looking industries such as biotechnology, and is an important global player in semiconductor process development, chemical testing, business consulting, and international business development.
Plasma-Therm is a U.S.-based manufacturer of advanced plasma processing equipment. The privately owned company produces systems for specialty semiconductor markets, including solid-state lighting, power, data storage, renewable energy, MEMS, nanotechnology, photonics, wireless communication, advanced photomask etching, and semiconductor packaging. Offering leading etching and deposition technologies and solutions, Plasma-Therm has won awards for customer satisfaction for the last 16 years from VLSIresearch. Sales and service locations throughout North America, Europe, and Asia Pacific meet the diverse needs of Plasma-Therm’s global customer base. More information is available at www.plasmatherm.com.